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HOME ORGANIZING COMMITTEES CALL FOR PAPERS SUBMISSION REGISTRATION VENUE REGISTRY

2026 International Conference on Electronic Chemicals, Photoresists and Wet Electronic Chemicals

About to ECPWE 2026

The 2026 International Conference on Electronic Chemicals, Photoresists and Wet Electronic Chemicals will be held in Chengdu in 2026. Chengdu, as a core city of the electronic information industry in western China, has formed a complete industrial chain in integrated circuits and display panels. The conference focuses on purity control of electronic-grade chemicals, resolution improvement of photoresists, and process optimization of wet electronic chemicals, covering key technologies such as ArF and EUV photoresist resin design, photoacid generator development, and line edge roughness control. Topics also include localization progress of supporting materials such as high-purity electronic gases, CMP polishing slurries, cleaning solutions, and etching solutions. The conference aims to break through bottleneck technologies in the semiconductor materials field, supporting the independent and controllable development of China's integrated circuit industry.

IMPORTANT DATES

2026-08-06-Submission Deadline

2026-08-14-Registration Deadline

2026-08-21-Conference Date

About a week after the submission-Notification Date

RECORD

All full paper submissions to the ECPWE 2026 could be written in English and will be sent to at least two reviewers and evaluated based on originality, technical or research content or depth, correctness, relevance to conference, contributions, and readability. All accepted papers of ECPWE 2026 will be published in the conference proceedings, which will be submitted to EI Compendex, Scopus for indexing.

Paper template

Please refer to the paper template for layout

Click to download

Register

All attendees must register in advance to attend the meeting

Consulting service

Submit

Please submit the full text/abstract of the paper to us through the electronic submission system

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Call For Papers

Conference Topics: Electronic Chemicals Photoresists Wet Electronic Chemicals Semiconductor Materials Electronic Materials Photolithography Process Material Purity Electronic Process Chemical Preparation Material Performance Photolithography Technology Electronic Devices Material Analysis Chemical Stability Electronic Processing Material Design Process Optimization Electronic Systems Chemical Engineering Material Applications Electronic Packaging Material Testing

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Indexing Service

Technical Sponsor

Call for Reviewers

As a platform for global academic communication, the quality of conference publication has always an aspect attracting much of our attention. To ensure quality of our publication and to better serve the peers in academic circle, we now call for reviewers among professionals and experts of the world. Professionals and experts who hold PhD (doctoral) degree in the conference related areas are encouraged to join in us and together, we will work hard to become a world-class academic conference. Please send us your CV by email (ecpwe@confsflow.com) if you are interested in it.

SCI Journal

Contributors are encouraged to submit papers / abstracts to the conference. The organizing committee will select high-quality papers and recommend them to SCI/SSCI journals. For specific matters, please contact the person in charge of the conferrence.

Submission Guidelines

Delegates are encouraged to submit their papers/abstracts to the conference. Good quality papers will be selected by the organizing committee and Prof. Soteris Kalogirou, the editor in chief. After it, the authors will be invited to extent their papers/abstracts and submit them to ecpwe@confsflow.com. The normal size of research papers is 4,000-6,000 words excluding abstract and references.

Submission Portal

If you have any questions or need any help about the conference, please feel free to contact our conference experts on the right:

李老师

TEL:185 8152 0396

QQ:3959598883

E-mail:ecpwe@confsflow.com

About Plagiarism Check

Crosscheck Powered by iThenticate will be used for plagiarism check. The amount of duplication from previously published content should be less than 20%; If the amount of duplication is 20% - 35%, modification maybe required; if the amount of duplication exceeds 35%, the article will be rejected. Please note that there will be no refund for no-shows.